Multilayer ceramic capacitor

ABSTRACT

A multilayer ceramic capacitor comprising an internal electrode layer, an internal dielectric layer having a thickness of less than 2 μm, and an external dielectric layer is provided, wherein the internal dielectric layer and external dielectric layer contain a plurality of dielectric particles, and when assuming that an average particle diameter of the entire dielectric particles in the internal dielectric layer is D50 a  (unit: μm), an average particle diameter of the entire dielectric particles existing at a position being away at least by 5 μm from the outermost internal electrode layer in the thickness direction is D50 b  (unit: μm), a ratio (D50 a /D50 b ) of the D50 a  and D50 b  is y (no unit), standard deviation of a particle size distribution of the entire dielectric particles in the internal dielectric layer is σ (no unit), and a ratio that dielectric particles (coarse particles) having an average particle diameter of 2.25 times of the D50 a  exist in the entire dielectric particles is p (unit: %), the y and x satisfy a relationship of y&lt;−0.75x+2.015 and y&gt;−0.75x+1.740, the σ satisfies σ&lt;0.091 and the p satisfies p&lt;2.85%; by which a TC bias characteristic can be expected to be improved while maintaining various electric characteristics, particularly a sufficient permittivity, even when the internal dielectric layer is made thin.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a multilayer ceramic capacitor.

2. Description of the Related Art

A multilayer ceramic capacitor is composed of an element body having the configuration that a plurality of dielectric layers and internal electrode layers are alternately stacked and a pair of external terminal electrodes formed on both end portions of the element body. The multilayer ceramic capacitor is produced by producing a pre-firing element body by alternately stacking pre-firing dielectric layers and pre-firing internal electrode layers exactly by necessary numbers first, then, after firing the same, forming a pair of external terminal electrodes on both end portions of the fired element body.

When producing a multilayer ceramic capacitor, since the pre-firing dielectric layers and the pre-firing internal electrode layers are fired at a time, a conductive material included in the pre-firing internal electrode layers is demanded to have a higher melting point than a sintering temperature of dielectric material powder included in the pre-firing dielectric layers, not to react with the dielectric material powder, and not to be dispersed in the fired dielectric layers, etc.

In recent years, to respond to the demands, as a conductive material included in the pre-firing internal electrode layers, instead of conventionally used Pt, Pd and other precious metals, an Ag—Pd alloy is used, or those using Ni, which can be fired in a reducing atmosphere, and other inexpensive base metals by giving reduction-resistance to the dielectric material have been developed.

The case of using Ni as a conductive material included in the pre-firing internal electrode layers will be explained as an example. Ni has a lower melting point comparing with that of dielectric material powder included in the pre-firing dielectric layer. Therefore, when pre-firing dielectric layers and pre-firing internal electrode layers including Ni as a conductive material are fired at a time, due to a difference of sintering start temperatures of the dielectric material powder and Ni, Ni internal electrode tends to become thick to be eventually broken as sintering of the dielectric material powder proceeds. Thus, to suppress this kind of breaking due to firing and to suppress sintering, there is proposed a technique of adding an additive dielectric material as a sintering retarder to an internal electrode layer paste for forming the internal electrode layers (refer to the patent articles 1 to 5). The additive dielectric material has a property of being dispersed from the internal electrode layer side to the internal dielectric layer side at the time of firing pre-firing internal dielectric layers and pre-firing internal electrode layers at a time.

In recent years, as a result that a variety of electronic apparatuses became compact, a multilayer ceramic capacitor installed inside the electronic apparatuses has been demanded to realize a compact body with a larger capacity, a low price and high reliability. To respond to the demands, a fired internal electrode layer, fired internal dielectric layer arranged between mutually facing fired internal electrode layers have been made thinner. Specifically, a thickness after firing per one fired internal dielectric layer has become as thin as 1 μm or so and, along therewith, a thickness before firing per one pre-firing internal dielectric layer has also become thinner.

As the pre-firing internal dielectric layer becomes thinner, a content of a dielectric material per one dielectric layer for forming it decreases.

For example, the case of preparing an internal electrode layer paste obtained by adding an additive dielectric material at a predetermined weight ratio to Ni as a conductive material and forming by applying the paste to be a predetermined thickness to a plurality of pre-firing internal dielectric layers, wherein the pre-firing thickness is gradually made thinner, will be considered. At this time, the weight ratio of a content of the additive dielectric material in the internal electrode layer with respect to a content of the dielectric material in the pre-firing internal dielectric layer (a content of the additive dielectric material in the internal electrode layer/a content of the dielectric material in the pre-firing internal dielectric layer) gradually increases as the thickness of the pre-firing internal dielectric layer applied with the internal electrode layer paste becomes thinner. It is because a content of the dielectric material in the pre-firing internal dielectric layer decreases as the thickness of the pre-firing internal dielectric layer becomes thinner, so that a denominator of a formula of the above weight ratio becomes smaller, consequently, a value of the weight ratio becomes larger.

When considering this from the pre-firing internal dielectric layer side, it means that the thinner the thickness becomes, the larger an amount of the additive dielectric material to be dispersed from the internal electrode layer side relatively becomes. Namely, a relative dispersal amount from the internal electrode layer side to the internal dielectric layer side increases.

Also, as the pre-firing internal dielectric layer becomes thinner as above, the pre-firing internal electrode layer is also demanded to be thinner, however, to make the pre-firing internal electrode layer thinner, the additive dielectric material as well as a conductive material, such as Ni, in the internal electrode layer paste for forming the same are demanded to be finer.

However, when the additive dielectric material to be dispersed from the internal electrode layer side to the internal dielectric layer side at the time of firing is made finer, grain growth of dielectric particles composing the internal dielectric layer may be accelerated to influence the fine structure of the internal dielectric layer in some cases. As explained above, the influence is furthermore enhanced when the dispersal amount of the additive dielectric material from the internal electrode layer side to the internal dielectric layer side becomes larger. The influence on the fine structure can be ignored when a thickness of the fired internal dielectric layer is made to be 2.0 μm or more, however, the influence on the fine structure tends to become large when the thickness of the fired internal dielectric layer is made thin as less than 2.0 μm. Along with the influence on the fine structure as such, it is liable that various characteristics, such as a bias characteristic and reliability, of a multilayer ceramic capacitor to be obtained are deteriorated.

To solve the disadvantages, the patent article 6 proposes a technique of adjusting an additive composition for an internal electrode layer paste and adjusting a ratio of an average particle diameter of dielectric particles contacting the internal electrode layer after firing and that of not contacting dielectric particles, concentration ratio of additive components and a core-shell ratio. According to the technique described in the patent article 6, a dielectric layer can be made thinner without deteriorating a temperature characteristic, tanδ and lifetime. However, bias characteristics were not sufficiently improved in the technique described in the patent article 6, so that a problem to be solved still remained.

The patent article 7 discloses a multilayer ceramic capacitor wherein an average particle diameter of dielectric particles near an external electrode is the same as or smaller than an average particle diameter of dielectric particles in an effective region.

However, the technique described in the patent article 7 is for a purpose of preventing cracks at the time of sintering the. external electrode, and an improvement of the bias characteristics cannot be expected.

Patent Article 1: The Japanese Unexamined Patent Publication No. 5-62855

Patent Article 2: The Japanese Unexamined Patent Publication No. 2000-277369

Patent Article 3: The Japanese Unexamined Patent Publication No. 2001-307939

Patent Article 4: The Japanese Unexamined Patent Publication No. 2003-77761

Patent Article 5: The Japanese Unexamined Patent Publication No. 2003-100544

Patent Article 6: The Japanese Unexamined Patent Publication No. 2003-124049

Patent Article 7: The Japanese Unexamined Patent Publication No. 2003-133164

SUMMARY OF THE INVENTION

An object of the present invention is to provide a multilayer ceramic capacitor, by which an improvement of a TC bias characteristic can be expected while obtaining various electric characteristics, particularly a sufficient permittivity, even when an internal dielectric layer is made thin.

To attain the above objects, according to the present invention, there is provided a multilayer ceramic capacitor comprising an internal electrode layer, an internal dielectric layer having a thickness of less than 2 μm, and an external dielectric layer wherein:

the internal dielectric layer and the external dielectric layer are formed by including a plurality of dielectric particles;

by assuming that

-   -   an average particle diameter of the entire dielectric particles         in the internal dielectric layer is D50a (unit: μm), and     -   an average particle diameter of the entire dielectric particles         existing at a position being away at least by 5 μm from the         outermost internal electrode layer in the thickness direction in         the external dielectric layer is D50b (unit: μm),     -   the ratio (D50a/D50b) of the D50a and the D50b is assumed to be         y (no unit); and

when assuming that

-   -   a thickness of the internal dielectric layer is x (unit: μm),     -   standard deviation of a particle size distribution of the entire         dielectric particles in the internal dielectric layers is σ (no         unit), and     -   a ratio that dielectric particles (coarse particles) having an         average particle diameter of 2.25 times of the D50a exist in the         entire dielectric particles of the internal dielectric layer is         p (unit: %),

the y and x satisfy a relationship of y<−0.75x+2.015 and y>−0.75x+1.740,

the σ satisfies Γ<0.091, and

the p satisfies p<2.85%.

The multilayer ceramic capacitor according to the present invention can be produced, for example, by the method below. Note that a production method of the multilayer ceramic capacitor of the present invention is not limited to the method below. Note that, in the method below, the case where the dielectric layer contains a main component composed of barium titanate (barium titanate, wherein particularly the mole ratio m of the so-called A site and the B site is 0.990 to 1.35, expressed by a composition formula (BaO)_(0.990 to 1.035).TiO₂) will be explained as an example.

The method comprises the steps of:

firing a stacked body formed by using a dielectric layer paste including a dielectric material and an internal electrode layer paste including an additive dielectric material;

wherein the dielectric material in the dielectric layer paste includes a main component material and a subcomponent material;

as the main component material, barium titanate expressed by a composition formula (BaO)_(m).TiO₂, wherein the mole ratio m is 0.990 to 1.035 is used;

the additive dielectric material in the internal electrode layer paste includes at least an additive main component material; and

as the additive main component material, barium titanate expressed by a composition formula (BaO)_(m′).TiO₂, wherein the mole ratio m′ is 0.993<m′<1.050, an ignition loss is less than 6.15%, and a lattice constant is more than 4.000 but less than 4.057 is used.

In this method, so-called A/B, that is the mole ratio m′ of the A site (the “(BaO)” part in the above formula) and a B site (the “TiO₂” part in the above formula), an ignition loss and a lattice constant of the additive main component material contained in the additive dielectric material in the internal electrode layer paste are controlled. By using as an additive main component material such barium titanate that various conditions are controlled therein, an existing state of dielectric particles composing fired internal dielectric layer can be controlled distinctly preferably and, particularly, characteristic of a TC bias can be furthermore improved.

Note that a composition of a dielectric oxide composing the main component is not limited to the barium titanate expressed by the above composition formula (BaO)_(0.990 to 1.035).TiO₂, and dielectric oxides below can be generally applied. The dielectric oxides are expressed by a composition formula (AO)_(m).BO₂, wherein the “A” is at least one element selected from Sr, Ca and Ba, “B” is at least one element of Ti and Zr, and the mole ratio m is 0.990 to 1.035.

In this method, it is sufficient if the additive dielectric material includes “at least an additive main component material”, and an additive subcomponent material is also contained in some cases. A composition of the additive subcomponent material in this case may be the same as or different from a composition of a subcomponent material included in the dielectric material in the dielectric layer paste.

A material composing the internal electrode layer of the multilayer ceramic capacitor is not particularly limited in the present invention and precious metals may be also used other than base metals. When composing the internal electrode layer by a base metal, the dielectric layer may contain a subcomponent including at least one kind of oxides of Mn, Cr, Si, Ca, Ba, Mg, V, W, Ta, Nb and R (R is at least one kind of rare earth elements, such as Y) and compounds to become these oxides due to firing, etc. other than the main component, such as barium titanate. As a result of containing the subcomponent, it is not made semiconductive even when fired in a reducing atmosphere and characteristics as a capacitor can be maintained. As explained above, when producing a multilayer ceramic capacitor having a dielectric layer containing a subcomponent other than the main component, the dielectric material contained in the dielectric layer paste contains a main component material and subcomponent material to form the main component and subcomponent after firing. In this case, as explained above, an additive dielectric material contained in the internal electrode layer paste also contains additive subcomponent material other than the additive main component material.

Preferably, the dielectric layer contains barium titanate expressed by a composition formula of (BaO)_(m).TiO₂, wherein the mole ratio m is 0.990 to 1.035, as a main component, a magnesium oxide and an oxide of rare earth elements as a subcomponent, furthermore, at least one kind selected from a barium oxide and a calcium oxide and at least one kind selected from silicon oxide, manganese oxide, vanadium oxide and molybdenum oxide as another subcomponent.

At this time, it is preferable that an additive dielectric material included in the internal electrode paste contains barium titanate expressed by a composition formula (BaO)_(m′).TiO₂, wherein the mole ratio m′ is 0.993<m′<1.050, an ignition loss is less than 6.15%, and a lattice constant is more than 4.000 but less than 4.057, as an additive main component material and magnesium oxide (including a compound to be magnesium oxide after firing) and oxides of rare earth elements as additive subcomponent materials, furthermore, at least one kind selected from a barium oxide (including a compound to be a barium oxide after firing) and a calcium oxide (including a compound to be a calcium oxide after firing) and at least one kind of a silicon oxide, a manganese oxide (including a compound to be a manganese oxide after firing), a vanadium oxide and a molybdenum oxide.

Note that a dielectric layer simply expressed by “dielectric layer” means one or both of an internal dielectric layer and external dielectric layer in the present invention.

In the present invention, even when a thickness x of the internal dielectric layer is made thin as less than 2 μm, grain growth of dielectric particles at the time of firing is suppressed and the fine structure inside the capacitor is controlled.

Specifically, (1) a relationship of the ratio (D50a/D50b) of an average particle diameter D50a of the entire dielectric particles composing the internal dielectric layers with respect to an average particle diameter D50b of dielectric particles corresponding to a part of the entire dielectric particles composing the external dielectric layers and a thickness of the internal dielectric layers is controlled to be in a predetermined range, (2) a particle size distribution of the entire dielectric particles in the dielectric layer is made sharp and unevenness of the granularity is made small, that is standard deviation a of the grain size distribution of the entire dielectric particles in the dielectric layer is made small, and (3) the ratio p of large dielectric particles (coarse particles) existing in the entire dielectric particles in the internal dielectric layer is made small.

As a result, even when a thickness of the internal dielectric layer is made thin as less than 2 μm, it is possible to obtain an effect of improving a TC bias characteristic while maintaining various electric characteristics, particularly a sufficient permittivity, of a multilayer ceramic capacitor to be obtained.

Particularly, according to the present invention, a multilayer ceramic capacitor having a furthermore improved TC bias characteristic (specifically, a TC bias characteristic that a capacity change rate from a measured value with no bias voltage applied at 20° C. is −20% or more when measuring at 120 Hz, 0.5 Vrms and a bias voltage of 2V/μm in a constant chamber held at 85° C.) can be provided.

Also, when the internal dielectric layer is furthermore made thinner, it is possible to improve characteristics of a DC breakdown voltage and short-circuiting defect other than the above TC bias characteristic by satisfying the relationship of the present invention. Particularly, the TC bias characteristic is improved when being closer to the lower limit value of y in relationship with x.

BRIEF DESCRIPTION OF DRAWINGS

These and other objects and features of the present invention will become clearer from the following description of the preferred embodiments given with reference to the attached drawings, in which:

FIG. 1 is a schematic sectional view of a multilayer ceramic capacitor according to an embodiment of the present invention;

FIG. 2 is an enlarged sectional view of a key part of an internal dielectric layer 2 shown in FIG. 1;

FIG. 3 is an enlarged sectional view of a key part of an external dielectric layer 20 shown in FIG. 1;

FIG. 4 is a graph showing respective temperature changes of binder removal processing, firing and annealing in an embodiment;

FIG. 5 is a graph showing relationship of x indicating a thickness of the internal dielectric layer 2 and y indicating a ratio (D50a/D50b) of an average particle diameter D50a of the entire dielectric particles 2 a in the internal dielectric layer 2 and an average particle diameter D50b of the entire dielectric particles 20 a existing at a position being away at least by 5 μm from the outermost internal electrode layer 3 a in the thickness direction in the external dielectric layer 20;

FIG. 6 is a SEM image showing a section condition of a sintered body after performing thermal etching on a sample 8 as an example;

FIG. 7 is a SEM image showing a section condition of a sintered body after performing thermal etching on a sample 6 as a comparative example;

FIG. 8 is a graph of a relationship of a particle diameter and frequency of dielectric particles composing an internal dielectric layer in the sample 8 as an example; and

FIG. 9 is a graph of a relationship of a particle diameter and frequency of dielectric particles composing an internal dielectric layer in the sample 6 as a comparative example.

DESCRIPTION OF THE PREFERRED EMBODIMENT

Below, the present invention will be explained based on embodiments shown in drawings.

In the present embodiment, as a multilayer ceramic capacitor having internal electrode layers and dielectric layers, a multilayer ceramic capacitor wherein a plurality of internal electrode layers and internal. dielectric layers are alternately stacked and external dielectric layers are arranged on both external end portions in the stacking direction of the internal electrode layers and internal dielectric layers will be explained as an example.

Multilayer Ceramic Capacitor

As shown in FIG. 1, a multilayer ceramic capacitor 1 according to an embodiment of the present invention has a capacitor element body having the configuration that internal dielectric layers 2 and internal electrode layers 3 are alternately stacked. On end portions on both sides of the capacitor element body 10, a pair of external electrodes 4 connected respectively to the internal electrode layers 3 arranged alternately inside the element body 10 are formed. The internal electrode layers 3 are stacked so that end surfaces on both sides are exposed alternately to surfaces of the mutually facing two end portions of the capacitor element body 10. The pair of external electrodes 4 are formed on both end portions of the capacitor element body 10 and connected to the exposed end surfaces of the alternately arranged internal electrode layers 3, so that a capacitor circuit is configured.

A shape of the capacitor element body 10 is not particularly limited, but is normally a rectangular parallelepiped shape. Also, a size thereof is not particularly limited and may be a suitable size in accordance with the use object, but is normally length (0.4 to 5.6 mm)×width (0.2 to 5.0 mm)×height (0.2 to 1.9 mm) or so.

In the capacitor element body 10, external dielectric layers 20 are arranged on both external end portions in the stacking direction of the internal electrode layers 3 and the internal dielectric layers 2 to protect inside the element body 10.

Internal Dielectric Layer and External Dielectric Layer

Compositions of the internal dielectric layers 2 and external dielectric layers 20 are not particularly limited in the present invention and are composed, for example, of a dielectric ceramic composition below.

A dielectric ceramic composition of the present invention contains as a main component barium titanate expressed by a composition formula (BaO)_(m).TiO₂, wherein a mole ration m is 0.990 to 1.035.

The dielectric ceramic composition of the present embodiment contains a subcomponent together with the above main component. As the subcomponent, those containing at least one kind of oxides of Mn, Cr, Ca, Ba, Mg, V, W, Ta, Nb and R (R is at least one kind of rare earth elements, such as Y) and compounds which becomes oxides by firing may be mentioned. By adding the subcomponent, characteristics as a capacitor can be obtained even by firing in a reducing atmosphere. Note that as an impurity, a trace component of C, F, Li, Na, K, P, S and Cl, etc. may be contained by not more than 0.1 wt % or so. Note that, in the present invention, compositions of the internal dielectric layers 2 and the external dielectric layers 20 are not limited to the above.

In the present embodiment, it is preferable that a composition below is used as the internal dielectric layers 2 and the external dielectric layers 20. The composition contains barium titanate expressed by a composition formula (BaO)_(m).TiO₂, wherein a mole ration m is 0.990 to 1.035, as a main component, a magnesium oxide and oxides of rare earth elements as a subcomponent and, as still another subcomponent, at least one kind selected from a barium oxide and a calcium oxide and at least one kind selected from a silicon oxide, a manganese oxide, a vanadium oxide and a molybdenum oxide. When calculating barium titanate in terms of [(BaO)_(0.990 to 1.035).TiO₂], a magnesium oxide in terms of MgO, oxides of rare earth elements in terms of R₂O₃, a barium oxide in terms of BaO, a calcium oxide in terms of CaO, a silicon oxide in terms of SiO₂, a manganese oxide in terms of MnO, a vanadium in terms of V₂O₅ and a molybdenum oxide in terms of MoO₃, the respective ratios with respect to 100 moles of [(BaO)_(0.990 to 1.035).TiO₂] are MgO: 0.1 to 3 moles, R₂O₃: more than 0 but not more than 5 moles, BaO+CaO: 0.5 to 12 moles, SiO₂: 0.5 to 12 moles, MnO: more than 0 mole but not more than 0.5 mole, V₂O₅: 0 to 0.3 mole and MoO₃: 0 to 0.3 mole.

Various conditions, such as the number layers to be stacked and the thickness, of the internal dielectric layers 2 may be suitably determined in accordance with the object and use and, in the present embodiment, a thickness of the internal dielectric layers 2 is made thin as preferably less than 2 μm, more preferably 1.5 μm or less, and furthermore preferably 1 μm or less. In the present embodiment, even when the thickness of the internal dielectric layer 2 is made thin as such, the TC bias characteristic is improved while obtaining various electric characteristics, particularly a sufficient permittivity. A thickness of the external dielectric layer 20 is, for example, 30 μm to several hundreds of μm or so.

As shown in FIG. 2, the internal dielectric layer 2 is formed by including a plurality of dielectric particles 2 a and a grain boundary phase 2 b formed between adjacent dielectric particles 2 a. As shown in FIG. 3, the external dielectric layer 20 is formed by including a plurality of dielectric particles 20 a and a grain boundary phase formed between adjacent dielectric particles 20 a.

As shown in FIG. 2, the plurality of dielectric particles 2 a are composed of contact dielectric particles 22 a contacting the internal electrode layers 3 and non-contact dielectric particles 24 a not contacting the internal electrode layers 3. The contact dielectric particles 22 a contact one of a pair of internal electrode layers 3 sandwiching an internal dielectric layer 2 including the contact dielectric particles 22 a and do not contact both of them.

Here, it is assumed that an average particle diameter of the entire dielectric particles 2 a in the internal dielectric layer (a part contributing to a capacitance) is D50a (unit: μm). It is assumed that an average particle diameter of the entire dielectric particles 20 a existing at a position being away at least by 5 μm from the outermost internal electrode layer 3 a in the thickness direction (the vertical direction in the figure) in the external dielectric layer 20 (a part not contributing to the capacitance) is D50b (unit: μm). The ratio (D50a/D50b) of the D50a and D50b is y (no unit). A thickness of the internal dielectric layer 2 is x (unit: μm). Standard deviation of a particle size distribution of the entire dielectric particles 2 a in the internal dielectric layer 2 is σ (no unit). The ratio that dielectric particles (coarse particles) having an average particle diameter of 2.25 times of the D50a exist in the entire dielectric particles 2 a in the internal dielectric layer 2 is p (unit: %)

At this time, in the present invention, y and x satisfy a relationship that y<−0.75x+2.015 and y>−0.75x+1.740. For example, when the thickness x of the internal dielectric layer 2 is 1.9 μm, y becomes 0.315 to 0.590 (note that 0.315 and 0.590 are excluded), and preferably 0.320 to 0.585. When the thickness x is 1.5 μm, y becomes 0.615 to 0.890 (note that 0.615 and 0.890 are excluded), and preferably 0.620 to 0.885. When the thickness x is 1.3 μm, y becomes 0.765 to 1.040 (note that 0.765 and 1.040 are excluded), and preferably 0.770 to 1.035. When the thickness x is 1.1 μm, y becomes 0.915 to 1.190 (note that 0.915 and 1.190 are excluded), preferably 1.051 to 1.185, and more preferably 1.145 to 1.180. When the thickness x is 0.9 μm, y becomes 1.065 to 1.340 (note that 1.065 and 1.340 are excluded), and preferably 1.070 to 1.335.

When y≧−0.75x+2.015 or y≦−0.75x+1.740 is satisfied, grain growth of dielectric particles 2 a and 20 a is not suppressed after firing, consequently, various electric characteristics, particularly the TC bias characteristic, cannot be improved.

The D50a is preferably 0.05 to 0.5 μm, and more preferably 0.05 to 0.4 μm. When the D50a is too large, it becomes difficult to make the layer thin, and the TC bias and other electric characteristics decline, while when too small, the permittivity declines.

The D50b is preferably the same as the D50a. The D50a and D50b are defined as below. The “D50a” is a value obtained by cutting the capacitor element body 10 in the stacking direction of the dielectric layers 2 and 20 and internal electrode layers 3, measuring an average area of 200 or more dielectric particles 2 a on the section shown in FIG. 2, calculating the diameter as an equivalent circle diameter, and multiplying the result by 1.5. The “D50b” is a value obtained by measuring an average area of 200 or more dielectric particles 2 a on the section shown in FIG. 2, calculating the diameter as an equivalent circle diameter, and multiplying the result by 1.5.

Note that the average particle diameter D50a of the entire dielectric particles 2 a here means an average particle diameter of the contact dielectric particles 22 a and non-contact dielectric particles 24 a. The average particle diameter does not include dielectric particles 20 a in the external dielectric layer 20 as a part not contributing to the capacitance but means an average particle diameter only of the dielectric particles 2 a in the internal dielectric layers 2 (a part contributing to the capacitance) sandwiched between internal electrode layers 3. The D50b means an average particle diameter of dielectric particles 20 a in the external dielectric layer 20 (a part not contributing to the capacitance) not sandwiched by internal electrode layers 3.

Also, in the present embodiment, σ satisfies σ<0.091, preferably 0.085 or less, and more preferably 0.069 or less. When the σ value is too large, disadvantages arise that bias characteristics and reliability decline, etc. The smaller the lower limit of the σ is, the better.

In the present invention, p satisfies p<2.85%, preferably 2.83% or less, and more preferably p<2.80 lo less. When the standard deviation σ is small, the ratio p is considered to become small being in proportional thereto. The smaller the lower limit of p is, the better.

Components of the grain boundary phase 2 b are normally an oxide of a material composing the dielectric material or the internal electrode material, an oxide of a separately added material and an oxide of a material mixed as an impurity in the procedure.

Internal Electrode Layer

The internal electrode layers 3 shown in FIG. 1 are composed of a conductive material of a base metal substantially serving as an electrode. As the base metal to be used as a conductive material, Ni or a Ni alloy is preferable. As a Ni alloy, an alloy of at least one kind selected from Mn, Cr, Co, Al, Ru, Rh, Ta, Re, Os, Ir, Pt and W, etc. with Ni is preferable, and a Ni content in the alloy is preferably 95 wt % or more. Note that the Ni or Ni alloy may contain a variety of trace components, such as P, C, Nb, Fe, Cl, B, Li, Na, K, F and S, by not more than 0.1 wt %.

In the present embodiment, a thickness of the internal electrode layers 3 is made thin as preferably less than 2 μm, and more preferably 1.5 μm or less.

External Electrode

As the external electrodes 4 shown in FIG. 1, at least one kind of Ni, Pd, Ag, Au, Cu, Pt, Rh, Ru and Ir, etc. or alloys of these may be normally used. Normally, Cu, a Cu alloy, Ni and a Ni alloy, etc., Ag, an Ag—Pd alloy and an In—Ga alloy, etc. are used. The thickness of the external electrodes 4 may be suitably determined in accordance with the use, and 10 to 200 μm or so is normally preferable.

Production Method of Multilayer Ceramic Capacitor

An example of a production method of the multilayer ceramic capacitor 1 according to the present embodiment will be explained next.

(1) First, a dielectric layer paste for composing the internal dielectric layers 2 and external dielectric layers 20 shown in FIG. 1 after firing and an internal electrode paste for composing the internal electrode layers 3 shown in FIG. 1 after firing are prepared.

Dielectric Layer Paste

The dielectric layer paste is fabricated by kneading dielectric materials and an organic vehicle.

As the dielectric materials, main component materials and subcomponent materials for forming a main component and subcomponent for composing the dielectric layers 2 and 20 after firing are included. The respective component materials are suitably selected from a variety of compounds to be composite oxides and oxides, for example, carbonate, nitrate, hydroxides and organic. metal compounds, etc. and mixed to use.

The dielectric materials are normally used as powder having an average particle diameter of 0.4 μm or less, and preferably 0.05 to 0.30 μm or so. Note that the average particle diameter here is a value obtained by observing particles of the materials by a SEM and calculated by an equivalent circle diameter.

The organic vehicle contains a binder and a solvent. As the binder, for example, ethyl cellulose, polyvinyl butyral, an acrylic resin, and other various normal binders may be used. Also, the solvent is not particularly limited and terpineol, butyl carbitol, acetone, toluene, xylene, ethanol and other organic solvents are used.

The dielectric layer paste may be formed also by kneading dielectric materials and a vehicle obtained by dissolving a water-soluble binder in water. The water-soluble binder is not particularly limited, and polyvinyl alcohol, methyl cellulose, hydroxyethyl cellulose, a water-soluble acrylic resin and emulsion, etc. are used.

A content of the respective components of the dielectric layer paste is not particularly limited, and a dielectric layer paste may be fabricated, for example, to contain about 1 to 50 wt % of a solvent.

The dielectric layer paste may contain additives selected from various dispersants, plasticizers, dielectrics, subcomponent compounds, glass flits, and insulators, etc. in accordance with need. When adding these additives to the dielectric layer paste, the total amount is preferably not more than 10 wt % or so.

Internal Electrode Layer Paste In the present embodiment, the internal electrode layer paste is fabricated by kneading a conductive material, additive dielectric material and an organic vehicle.

As the conductive material, Ni, a Ni alloy, furthermore, a mixture of these are used. The conductive material may be a spherical shape, a scale shape, etc. and the shape is not particularly limited, and may be a combination of these shapes. In the case of a spherical shape, an average particle diameter of the conductive material is normally 0.5 μm or less, and preferably 0.01 to 0.4 μm or so. It is to attain a highly thin layer. The conductive material is contained in the internal electrode layer paste by preferably 35 to 60 wt %.

The additive dielectric materials function to suppress sintering of internal electrodes (conductive material) in the firing step. In the present embodiment, the additive dielectric materials contain an additive main component material and an additive subcomponent material.

In the present embodiment, as an additive main component material, barium titanate expressed by a composition formula (BaO)_(m′).TiO₂, wherein the mole ratio m′ is 0.993<m′<1.050, preferably 0.995≦m′≦1.035, and more preferably 1.000≦m′≦1.020, is used. By using barium titanate having an adjusted additive main component material value m′, an existing state of dielectric particles 2 a composing the internal dielectric layers 2 after firing is controlled and, even when the layer is made thin, the TC bias characteristic is improved while obtaining various electric characteristics, particularly permittivity. When the m′ becomes large, the a in the internal dielectric layers 2 of an obtained capacitor 1 tends to be small. When the m′ becomes too large, it is liable that sintering becomes insufficient.

In the present embodiment, those having a specific ignition loss are used as an additive main component material. By using a main component material having a specific ignition loss as an additive, a particle configuration of the internal dielectric layer can be effectively controlled, and a bias characteristic of the capacitor 1 can be furthermore effectively improved. The ignition loss of the additive main component material is less than 6.15%, preferably less than 5.0%, and more preferably less than 3.5%. When the ignition loss becomes too large, it is liable that the bias characteristic cannot be improved. Note that the lower the lower limit of the ignition loss is, the more preferable. Ultimately, 0% is idealistic, but such an additive main component material is normally difficult to be produced. Here, the “ignition loss” means a weight change rate when holding from 200° C. to 1200° C. for 10 minutes in thermal treatment (processing of heating from the room temperature to 1200° C. at a temperature rising rate of 300° C./hour in the air and maintaining at 1200° C. for 10 minutes) on the additive main component material. It is considered that the ignition loss is generated as a result that adsorption components and an OH group normally contained in the additive dielectric material are evaporated due to the thermal treatment.

In the present embodiment, those having a specific lattice constant are used as an additive main component material. By using a main component having a specific lattice constant as an additive, the particle structure of the internal dielectric layer 2 can be effectively controlled and the bias characteristic of the capacitor 1 can be improved furthermore effectively. The lattice constant of the additive main component material is more than 4.000 but less than 4.057, and preferably more than 4.000 and less than 4.040. The effect of improving various electric characteristics cannot be obtained when the lattice constant is too small or too large.

An average particle diameter of the additive main component material may be the same as the particle diameter of a main component material contained in the dielectric material in the dielectric layer paste, but it is preferably smaller than that, more preferably 0.01 to 0.2 μm, and particularly preferably 0.01 to 0.15 μm. Note that the average particle diameter value is known to correlate with a specific surface area (SSA).

The additive dielectric materials (Only additive main component materials are included in some cases, and both of additive main component materials and additive subcomponent materials are included in other cases. Below, it will be the same unless otherwise mentioned.) are not particularly limited but it is preferable to be produced, for example, by the oxalate method, hydrothermal synthesis method, sol-gel method, hydrolysis and alkoxide method, etc. By using these method, it is possible to efficiently produce an additive dielectric material including an additive main component material having the above specific ignition loss and lattice constant.

The additive dielectric material is included in the internal electrode layer paste preferably 5 to 30 wt %, and more preferably 10 to 20 wt % with respect to the conductive material. When a content of the additive dielectric material in the paste is too small, the effect of suppressing sintering of the conductive material declines, while when too large, continuity of the internal electrode declines. Namely, a disadvantage that a sufficient capacitance as a capacitor cannot be secured may be caused when the content of the additive dielectric material is too small or too large.

The organic vehicle contains a binder and a solvent.

As the binder, for example, ethyl cellulose, an acrylic resin, polyvinyl butyral, polyvinyl acetal, polyvinyl alcohol, polyolefin, polyurethane, polystyrene, and copolymers of these, may be mentioned. The binder is contained in the internal electrode layer paste preferably by 1 to 5 wt % with respect to mixed powder of the conductive material and the additive dielectric material. When the binder is too scarce, the strength tends to decline, while when too much, metal filling density of an electrode pattern before firing declines and smoothness of the internal electrode layer 3 may be hard to be maintained after firing.

As the solvent, any of well known solvents, for example, terpineol, dihydroterpineol, butyl carbitol and kerosene, etc. may be used. A content of the solvent is preferably 20 to 50 wt % or so with respect to the entire paste.

The internal electrode layer paste may contain a plasticizer. As a plasticizer, benzylbutyl phthalate (BBP) and other phthalate esters, adipic acid, phosphoric ester and glycols, etc. may be mentioned.

(2) Next, a green chip is produced by using the dielectric layer paste and the internal electrode layer paste. When using a printing method, the dielectric layer paste and the internal electrode layer paste in a predetermined pattern are stacked by printing on a carrier sheet, cut to be a predetermined shape, and removed from the carrier sheet, so that a green chip is obtained. When using a sheet method, a green sheet is formed by forming the dielectric layer paste to be a predetermined thickness on a carrier sheet, the internal electrode layer paste is printed to be a predetermined pattern thereon, then, they are stacked to obtain a green chip.

(3) Next, binder removal is performed on the obtained green chip. The binder removal is processing for, for example as shown in FIG. 4, raising atmosphere temperature T0 from the room temperature (25° C.) to binder removal holding temperature T1 at a predetermined temperature raising rate, holding at the T1 for predetermined time, then, lowering the temperature at a predetermined temperature lowering rate.

In the present embodiment, the temperature raising rate is preferably 5 to 300° C./hour, and more preferably 10 to 100° C. The binder removal holding temperature T1 is preferably 200 to 400° C. and more preferably 220 to 380° C., and the holding time at the T1 is preferably 0.5 to 24 hours, and more preferably 2 to 20 hours. The temperature lowering rate is preferably 5 to 300° C./hour, and more preferably 10 to 100° C./hour.

A processing atmosphere of the binder removal is preferably air or reducing atmosphere. As the reducing atmosphere, for example, a wet mixed gas of N₂ and H₂ is preferably used. An oxygen partial pressure in the processing atmosphere is preferably 10⁻⁴⁵ to 10⁵ Pa. When the oxygen partial pressure is too low, the binder removal effect tends to decline, while when too high, the internal electrode layer tends to be oxidized.

(4) Next, the green chip is fired. The firing is processing for, for example as shown in FIG. 4, raising atmosphere temperature T0 from the room temperature (25° C.) to firing holding temperature T2 at a predetermined temperature raising rate, holding at the T2 for predetermined time, then, lowering the temperature at a predetermined temperature lowering rate.

In the present embodiment, the temperature raising rate is preferably 50 to 500° C./hour, and more preferably 100 to 300° C./hour.

The firing holding temperature T2 is preferably 1100 to 1350° C., more preferably 1100 to 1300° C., and furthermore preferably 1150 to 1250° C. The holding time at the T2 is preferably 0.5 to 8 hours, and more preferably 1 to 3 hours. When the T2 is too low, densification becomes insufficient even if the holding time at the T2 is made long, while when too high, grain growth of dielectric particles, breaking of electrodes, deterioration of a capacitance-temperature characteristic due to dispersion of a conductive material composing the internal electrode layers, and reducing of a dielectric ceramic composition composing the dielectric layers are easily caused.

The temperature lowering rate is preferably 50 to 500° C./hour, and more preferably 150 to 300° C./hour. The firing processing atmosphere is preferably a reducing atmosphere. As a reducing atmosphere gas, for example, a wet mixed gas of N₂ and H₂ is preferably used. Note that the binder removal, firing and annealing may be performed successively or separately. An oxygen partial pressure in the firing atmosphere is preferably 6×10⁻⁹ to 10⁻⁴ Pa. When the oxygen partial pressure is too low, a conductive material of the internal electrode layers is abnormally sintered to be broken, while when too high, the internal electrode layers tend to be oxidized.

(5) Next, when firing the green chip in a reducing atmosphere, it is preferable to successively perform thermal treatment (annealing). Annealing is processing for re-oxidizing the dielectric layers and characteristics as a capacitor as a final product can be obtained thereby.

Annealing is processing for, for example as shown in FIG. 4, raising atmosphere temperature T0 from the room temperature (25° C.) to anneal holding temperature T3 at a predetermined temperature raising rate, holding at the T3 for predetermined time, then, lowering the temperature at a predetermined temperature lowering rate.

In the present embodiment, the temperature raising rate is preferably 100 to 300° C./hour, and more preferably 150 to 250° C./hour.

The annealing holding temperature T3 is preferably 800 to 1100° C., and more preferably 900 to 1100° C. The holding time at the T3 is preferably 0 to 20 hours, and more preferably 2 to 10 hours. When the T3 is too low, oxidization of the dielectric layers 2 becomes insufficient, so that it is liable that the IR becomes low and the IR lifetime becomes short. When the T3 is too high, not only the internal electrode layers 3 is oxidized to decrease the capacity, but the internal electrode layers 3 react with the dielectric base material to easily cause deterioration of a capacity-temperature characteristic, a decline of the IR, and a decline of the IR lifetime.

The temperature lowering rate is preferably 50 to 500° C./hour, and more preferably 100 to 300° C./hour.

The annealing processing atmosphere is preferably a neutral atmosphere. As a neutral atmosphere gas, for example, a wet N₂ gas is preferably used. In the annealing, the atmosphere may be changed after raising to the holding temperature T3 in a N₂ gas atmosphere, or the whole annealing process may be performed in a wet N₂ gas atmosphere. An oxygen partial pressure in the annealing atmosphere is preferably 2×10⁻⁴ to 1 Pa. When the oxygen partial pressure is too low, re-oxidization of the dielectric layers 2 becomes difficult, while when too high, the internal electrode layers 3 tend to be oxidized.

In the present embodiment, the annealing may have only the temperature raising step and the temperature lowering step. Namely, the temperature holding time may be zero. In this case, the holding temperature T3 is the same as the highest temperature.

In the above binder removal processing, firing and annealing, for example, a wetter, etc. may be used to wet a N₂ gas and mixed gas, etc. In this case, the water temperature is preferably 75° C. or so.

As a result of the above respective processing, a capacitor element body 10 composed of a sintered body is formed.

(6). Next, external electrodes 4 are formed on the obtained capacitor element body 10. Formation of the external electrodes 4 can be attained by well known methods, such that after polishing end surfaces of the capacitor element body 10 composed of the above sintered body by barrel polishing or sand blast, etc., burning an external electrode paste containing at least one kind of Ni, Pd, Ag, Au, Cu, Pt, Rh, Ru and Ir, etc. or alloys of these, or applying an In—Ga alloy on the both end surfaces. A coverage layer may be formed by soldering, etc. on a surface of the external electrode 4 in accordance with need.

An explanation was made on embodiments of the present invention, but the present invention is not limited to the embodiments, and various modifications may be made within the scope of the present invention. For example, in the above embodiments, the binder removal processing, firing and annealing were performed separately, but the present invention is not limited to this and at least two steps may be performed continuously. When performing continuously, it is preferable that the atmosphere is changed without cooling after the binder removal processing, the temperature is raised to the firing holding temperature T2 to perform firing, then, cooled to reach the annealing holding temperature T3, at which point the atmosphere is changed to perform annealing.

EXAMPLES

Below, the present invention will be explained further in detail based on examples, but the present invention is not limited to the examples.

Example 1 Production of Dielectric Layer Paste

First, a dielectric material, a polyvinyl butyral (PVB) resin as a binder, diotycle phthalate (DOP) as a plasticizer, and ethanol as a solvent were prepared.

The dielectric material was produced by wet mixing barium titanate having an average particle diameter of about 0.2 μm as a main component material (specifically, barium titanate expressed by a composition formula of (BaO)_(m).TiO₂, wherein the mole ratio m is 0.990 to 1.035), 0.2 mole % of MnC, 0.5 mole % of MgO, 0.3 mole % of V₂O₅, 2 mole % of Y₂O₃, 3 mole % of CaCO₃, 3 mole % of BaCO₃ and 3 mole % of SiO₂ as subcomponents for 16 hours by a ball-mill and dried.

Next, 10 wt % of a binder, 5 wt % of a plasticizer and 150 wt % of a solvent with respect to the dielectric material were weighed, kneaded by a ball-mill and made to be a slurry, so that a dielectric layer paste was obtained.

Production of Internal Electrode Layer Paste Ni particles having an average particle diameter of 0.2 μm as a conductive material, an additive dielectric material, an ethyl cellulose resin as a binder, and terpineol as a solvent were prepared.

As the additive dielectric material, what containing barium titanate (specifically, barium titanate expressed by a composition formula of (BaO)_(m′).TiO₂: that is, Ba_(m′).TiO_(2+m′)) as an additive main component material, MnCO₃, MgO, V₂O₅, Y₂O₃, CaCO₃, BaCO₃ and SiO₂ as subcomponents was used. Note that as the barium titanate as an additive main component material, those having a mole ratio m′ in the composition formula, an ignition loss and a lattice constant changed as shown in the table were used for respective samples.

Note that a value of an ignition loss of the additive main component material in each table is a value of a weight change rate (the unit is %) in a range of 200° C. to 1200° C. (10 minutes) in heating processing of heating barium titanate as additive main component material powder from the room temperature to 1200° C. at a temperature raising rate of 300° C./hour in the air, and holding at 1200° C. for 10 minutes. In the table, for example, “−5.00%” means that weight decreased by 5.00% in the case where weight heated at 100° C. was assumed to be 100 and weight at 1200° C. after 10 minutes became 95. The calculation formula is given below. Weight Change Rate=((W _(after) −W _(before) e)/W _(before))×100 Note that W_(after) was weight subjected to thermal treatment at 1200° C. for 10 minutes and W_(before) was weight heated at 200° C. in the formula.

Also, the lattice constant in the table is a value (no unit) calculated as a lattice constant of a cubic crystal taken from peak positions at the angle range of 10 to 85 degrees, obtained by using a XRD (rent2000 made by RIGAKU Co., Ltd.) under a condition of an electric current of 300 mA and an accelerating voltage of 50 kV.

Next, 20 wt % of additive dielectric material was added to the conductive material. 5 wt % of a binder and 35 wt % of solvent were weighed and added to mixed powder of the conductive material and additive dielectric material, kneaded by a ball-mill, and made to be a slurry, so that an internal electrode layer paste was obtained.

Production of Multilayer Ceramic Chip Capacitor Sample

By using the obtained dielectric layer paste and the internal electrode layer paste, a multilayer ceramic capacitor 1 shown in FIG. 1 was produced as below.

First, the dielectric layer paste was applied to be a predetermined thickness to a PET film by a doctor blade method and dried, so that a ceramic green sheet having a thickness of 2 μm was formed. In the present embodiment, the ceramic green sheet as a first green sheet was prepared by a plural number.

The internal electrode paste was formed to be a predetermined pattern on the obtained first green sheet, so that a ceramic green sheet having an electrode pattern having a thickness of 1 μm or so was obtained. In the present embodiment, this ceramic green sheet as a second green sheet was prepared by a plural number.

The first green sheets were stacked to be a thickness of 300 μm to form a green sheet group. On top of the green sheet group, 11 of second green sheets were stacked, further thereon, the same green sheet group as above was formed by stacking, heated and pressurized under a condition of a temperature of 80° C. and a pressure of 1 ton/cm² to obtain a green stacked body.

Next, the obtained stacked body was cut to be a size of 3.2 mm in length×1.6 mm by width×1.0 mm by height, then, binder removal-processing, firing and annealing were performed under the condition below, so that a sintered body was obtained. A graph showing respective temperature changes of the binder removal, firing and annealing is shown in FIG. 3.

The binder removal was performed under a condition of a temperature raising rate of 30° C./hour, a holding temperature T1 of 260° C., a holding time of 8 hours, a temperature lowering rate of 200° C./hour and a processing atmosphere of an air atmosphere.

The firing was performed under a condition of a temperature raising rate of 200° C./hour, a holding temperature T2 as shown in Table 1, a holding time of 2 hours, a temperature lowering rate of 200° C./hour and a processing atmosphere of a reducing atmosphere (adjusted by letting a mixed gas of N₂ and H₂ into steam under an oxygen partial pressure of 10⁻⁶).

The annealing was performed under a condition of a temperature raising rate of 200° C./hour, a holding temperature T3 of 1050° C., a holding time of 2 hours, a temperature lowering rate of 200° C./hour and a processing atmosphere of a neutral atmosphere (adjusted by letting a N₂ gas into steam under an oxygen partial pressure of 0.1).

A wetter was used for wetting a gas in the firing and annealing, and the water temperature was 20° C.

An average particle diameter (D50a) of entire dielectric particles 2 a in the internal dielectric layers 2 was calculated as below. The obtained sintered body was polished to be half the length from the end portion of the internal electrode layers, then, the polished surface was subjected to mirror polish processing by a diamond paste. After that, thermal etching processing (a temperature raising rate and lowering rate of 300° C./hour, a holding temperature of 1200° C. and a holding time of 10 minutes) was performed, and particles were observed by a scanning electron microscope (SEM). Then, a section area (S) of particles was obtained from a SEM image showing a section condition of the sintered body after the thermal etching. Note that a position to be observed was a range of 100 μm×100 μm including the center of the polished surface, and five views (about 90 contact dielectric particles were observed per one view) were freely selected from this range. A shape of the dielectric particles was considered sphere, and a particle diameter (d) was obtained from the formula below. Particle Diameter (d)=2×({square root}(S/π))×1.5. The obtained particle diameters were made to be a histogram, and a value at which the degree accumulation becomes 50% was considered an average particle diameter (D50a). The D50 value was calculated as an average value in the n number=250.

The D50b (an average particle diameter of the entire dielectric particles 20 a existing at a position being away at least by 5 μm from the outermost internal electrode layer 3 a in the thickness direction in the external dielectric layer 20) was obtained by measuring in the same method as in the D50a.

Note that values of the D50a and D50b are calculated as an average value of the number n=250.

The standard deviation (σ) was calculated based on the next formula. Standard Deviation (σ)={square root}(((nΣx²)−(Σx) ²)/n(n−1))

A ratio p (unit: %) that dielectric particles (coarse particles) having an average particle diameter of 2.25 times of the D50a exist in the entire dielectric particles was also obtained from the above observation result.

Note that FIG. 6 and FIG. 7 show SEM images of a section condition of the sintered body of sample 8 and sample 6 after thermal etching. FIG. 8 and FIG. 9 are graphs of a relationship of a particle diameter and frequency of dielectric particles composing an internal dielectric layer in the sample 8 and sample 6, respectively.

For measuring electric characteristics, end surfaces of the obtained sintered body were polished by sand blast, then, an In—Ga alloy was applied to form a test electrode, so that a multilayer ceramic chip capacitor sample was obtained. A size of the capacitor sample was 3.2 mm by length×1.6 mm by width×1.0 mm by height, a thickness x of an internal dielectric layer 2 was about 1.1 μm, and a thickness of an internal electrode layer 3 was 0.9 μm.

A TC bias, DC dielectric breakdown strength, short-circuiting defective rate, and specific permittivity ε of the obtained capacitor samples were evaluated.

The TC bias was evaluated by measuring a bias voltage of the capacitor samples at 120 Hz, 0.5 Vrms and 2 V/μm in a constant chamber held at 85° C. by a digital LCR meter (4274A made by YHP) and calculating a capacity change rage from measured values at 20° C. not applied with a bias voltage. In the evaluation reference, those becoming larger than −20% were determined preferable.

The DC dielectric breakdown strength was obtained by applying a DC voltage at a temperature raising rate of 50 V/sec. to the capacitor samples, measuring a voltage when a leak current of 0.1 mA was detected (DC breakdown voltage: VB, unit: V/μm), and calculating the average value. In the evaluation reference, 65V/μm or higher were determined preferable.

The short-circuiting defective rate was obtained by measuring resistance of 100 capacitor samples at 25° C. by using an insulation resistance tester (E2377 multimeter made by HP). Those having a resistance value of 10Ω or lower were determined as short-circuiting defectives, the number of the defectives were obtained and percentage (%) with respect to the entire number was calculated. In the evaluation standard, 50% or lower were determined preferable.

The specific permittivity ε was calculated from a capacitance measured on the capacitor samples under a condition of a frequency of 1 kHz, and an input signal level (measurement voltage) of 1.0 Vrms at a reference temperature of 25° C. by a digital LCR meter (4274A made by YHP). In the evaluation reference, 1600 or more were determined preferable.

The results are shown in the table. TABLE 1 Additive Main Component Firing Short- Material (BaTiO₃) Temperature Circuiting Ignition Lattice T2 TC Bias VB Defective Sample A/B Loss % Constant ° C. y σ p % % V/μm Rate % ε Evaluation *1 1.003 −3.81 4.055 1240 1.190 0.069 2.80 −20.7 53 55 1957 X 2 1.003 −3.81 4.039 1240 1.185 0.069 2.80 −19.8 78 50 1950 ◯ 3 1.003 −3.81 4.027 1240 1.153 0.069 2.80 −19.7 81 42 1823 ◯ 4 1.003 −3.81 4.015 1240 1.051 0.069 2.80 −18.5 82 35 1620 ◯ *5 1.003 −3.80 3.998 1240 0.915 0.069 2.80 −16.8 86 30 1560 X *6 1.000 −4.1 4.019 1240 1.145 0.091 2.50 −21.2 65 64 1840 X 7 1.005 −4.1 4.019 1240 1.145 0.085 2.51 −19.9 72 49 1810 ◯ 8 1.012 −4.1 4.019 1240 1.145 0.062 2.51 −19.1 85 20 1745 ◯ *9 1.003 −3.80 3.998 1240 1.180 0.069 2.85 −20.5 59 74 1830 X 10 1.008 −3.45 4.018 1240 1.180 0.067 2.83 −19.9 75 32 1955 ◯ 11 1.008 −2.95 4.018 1240 1.180 0.067 2.12 −19.6 78 28 1951 ◯ 12 1.008 −2.10 4.018 1240 1.180 0.067 1.35 −19.2 81 25 1946 ◯ The mark “*” indicates a comparative example in Table 1. Thickness of an internal dielectric layer x = 1.1 μm

As shown in Table 1, in capacitor samples having an internal dielectric layer thickness x of 1.1 μm, in the sample 1 wherein y exceeds the above limit of the present invention, the e is preferable but the TC bias characteristic, VB and short-circuiting defective rate are poor. The reason why the TC bias characteristic declined in the sample 1 was that grain growth of the dielectric layer proceeded.

In the sample 5 wherein y is lower than the lower limit of the present invention, the TC bias characteristic, VB and short-circuiting defective are preferable, but the ε becomes poor.

In the sample 6 wherein a exceeds the upper limit of the present invention, the ε and VB are preferable, but the TC bias characteristic and the short-circuiting defective rate become poor. Particularly, as shown in FIG. 7 and FIG. 9, in the sample 6, variation in particle diameter of the dielectric particles is wide even visually in the internal dielectric layer, and it is confirmed that coarse particles exist more or less.

In the sample 9 wherein the p exceeds the upper limit of the present invention, the ε is preferable, but the TC bias characteristic, VB and the short-circuiting defective rate are poor.

On the other hand, in the samples 2 to 4, 7, 8 and 10 to 12, wherein all values were within a range of the present invention, all of TC bias characteristic, VB, short-circuiting defective rate and the e were confirmed to be preferable. Particularly, in the samples 2 to 4, the TC bias was −20% or more and it was confirmed that this characteristic was extremely improved. Particularly, as shown in FIG. 6 and FIG. 8, in the sample 8, variation in particle diameter of the dielectric particles is small visually in the internal dielectric layers, and it was confirmed that coarse particles scarcely exist.

Also, from the samples 2 and 4, it was confirmed that even if the σ and p values were the same, it was possible to enhance an effect of improving the TC bias characteristic by making y small. From the samples 7 and 8, it was confirmed that even when the y and p values were the same, it was possible to enhance an effect of improving the TC bias characteristic by making σ small. From the samples 10 to 12, it was confirmed that even when the y and σ values were the same, it was possible to enhance an effect of improving the TC bias characteristic by making p small.

Note that relationship of the x and y is shown in FIG. 5.

Example 2

Other than changing a thickness x of the internal dielectric layer 2 to 1.9 μm, 1.5 μm and 0.9 μm, capacitor samples were produced in the same way as in the example 1, and the same evaluation was made. As a result, the same results were obtained.

Comparative Example 1

Other than changing a thickness x of the internal dielectric layer 2 to 2.0 μm and 2.2 μm, capacitor samples were produced in the same way as in the example 1, and the same evaluation was made. As a result, in the case where the thickness of the internal dielectric layer 2 was 2 μm or more, an effect of an additive dielectric material was small, so that grain growth of the dielectric layer was scarcely observed and almost no difference was recognized in an average particle diameter of the dielectric particles of the internal dielectric layer 2 by ceramic particles (additive dielectric material) in the internal electrode layers. 

1. A multilayer ceramic capacitor comprising an internal electrode layer, an internal dielectric layer having a thickness of less than 2 μm, and an external dielectric layer wherein: said internal dielectric layer and the external dielectric layer are formed by including a plurality of dielectric particles; by assuming that an average particle diameter of the entire dielectric particles in said internal dielectric layer is D50a (unit: μm), and an average particle diameter of the entire dielectric particles existing at a position being away at least by 5 μm from the outermost internal electrode layer in the thickness direction in said external dielectric layer is D50b (unit: μm), the ratio (D50a/D50b) of said D50a and said D50b is assumed to be y (no unit); and when assuming that a thickness of said internal dielectric layer is x (unit: μm), standard deviation of a particle size distribution of the entire dielectric particles in said internal dielectric layers is σ (no unit), and a ratio that dielectric particles (coarse particles) having an average particle diameter of 2.25 times of said D50a exist in the entire dielectric particles of said internal dielectric layer is p (unit: %) said y and x satisfy a relationship of y<−0.75x+2.015 and y>−0.75x+1.740, said σ satisfies σ<0.091, and said p satisfies p<2.85%. 